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立即出售 - Applied Material 200mm SNNF Centura 4 Chamber Etch System 【Phoenix, Arizona, USA 美国凤凰城】

交易方式:协商交易     截止日期:2022年07月08日收藏


Any Offers will be immediate reviewed 



YOM 1997

Last in Production 2018, Professionally Deinstalled, 208V, 50/60 Hz, with Transfer Chamber Lift, HP Robot with Metal Blade, Endpoint with Four Monochromators, Smoke and Water Leak Detect, Independent Helium Cooling, Seriplex Gas Panel w/Top Feed Exhaust, Wafer Mapping, Wafer on Blade Sensors and Umbilicals.


Chamber Breakdown Includes: [Chamber A: DPS R0 Poly, w/1110-01043 Source RF match AZX 90; Dual manometers with .1Torr and 10Torr Heads, Backside Helium Cooling; 200mm Cathode, & Osaka TG2003M Turbo] [Chamber B: Poly Etch: Mark II 3 Piece Chamber; Mark II Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber C: Poly Etch: Uni-Body Chamber; MxP Shields, MxP Magnets, ESC Cathode, Phase IV RF Match, & Alcatel 5402 CTS Turbo] [Chamber D: DPS R1 Metal/Deep Trench Etch: Source RF Match w/AZX-90 Upgrade, Dual Manometers with .1Torr and 10Torr Heads, VAT Throttling Gate Valve, Heated Pump Stack, 200mm Cathode SNNF ESC, & Alcatel ATH 1300M Turbo] [Chamber E: Wafer Orienter, 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array] [Chamber F: Wafer Orienter , 200mm Lift Hoop, 200mm Pedestal, Laser, & CCD Array]


Remote Equipment Includes: (1ea.) RF Rack with the Following Configured Generators: [(1ea.) Advanced Energy RFG/AZX Control; (2ea.) Advanced Energy RF-20RWC; (2ea.) ENI OEM 12B-02; (1ea.) ENI OEM 12B3 and (1ea.) Osaka TD2000 turbo controller]; (2ea.) Neslab HX150 with Heater Control; (1ea.) Neslab HX150 without Heater Control; (3ea.) Edwards IH80 Pumps; & (2ea.) Alcatel ADP81 Pumps.








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Contacts:

Eric Zhang 张先生

139 1795 6751

Eric.Zhang@LiquidityServices.com






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